TY - JOUR
T1 - Spacer-Defined Intrinsic Multiple Patterning
AU - Laney, Sophia Katharine
AU - Li, Tao
AU - Michalska, Martyna
AU - Ramirez, Francisco
AU - Portnoi, Mark
AU - Oh, Junho
AU - Tiwari, Manish K.
AU - Thayne, Iain G.
AU - Parkin, Ivan P.
AU - Papakonstantinou, Ioannis
N1 - Funding Information:
The work was conducted in the framework of the European Research Council (ERC) starting grant IntelGlazing, Grant No. 679891. We are grateful to Lloyd’s Register Foundation for an International Consortium of Nanotechnology (ICON) research grant and UCL BEAMS School for a Ph.D. studentship. Funding by the ERC grant NICEDROPS, Grant No. 714712, is also gratefully acknowledged. We acknowledge the invaluable support of the James Watt Nanofabrication Centre at the University of Glasgow, and we would particularly like to thank M. Dragsnes and his technical team for their contributions. Finally, we acknowledge the assistance of the technical team in the London Centre for Nanotechnology (LCN).
Publisher Copyright:
Copyright © 2020 American Chemical Society.
PY - 2020/9/22
Y1 - 2020/9/22
N2 - Periodic nanotube arrays render enhanced functional properties through their interaction with light and matter, but to reach optimal performance for technologically prominent applications, such as wettability or photonics, structural fine-tuning is essential. Nonetheless, a universal and scalable method providing independent dimension control, high aspect ratios, and the prospect of further structural complexity remains unachieved. Here, we answer this need through an atomic layer deposition (ALD)-enabled multiple patterning. Unlike previous methods, the ALD-deposited spacer is applied directly on the prepatterned target substrate material, serving as an etching mask to generate a multitude of tailored nanotubes. By concept iteration, we further realize concentric and/or binary nanoarrays in a number of industrially important materials such as silicon, glass, and polymers. To demonstrate the achieved quality and applicability of the structures, we probe how nanotube fine-tuning induces broadband antireflection and present a surface boasting extremely low reflectance of <1% across the wavelength range of 300-1050 nm.
AB - Periodic nanotube arrays render enhanced functional properties through their interaction with light and matter, but to reach optimal performance for technologically prominent applications, such as wettability or photonics, structural fine-tuning is essential. Nonetheless, a universal and scalable method providing independent dimension control, high aspect ratios, and the prospect of further structural complexity remains unachieved. Here, we answer this need through an atomic layer deposition (ALD)-enabled multiple patterning. Unlike previous methods, the ALD-deposited spacer is applied directly on the prepatterned target substrate material, serving as an etching mask to generate a multitude of tailored nanotubes. By concept iteration, we further realize concentric and/or binary nanoarrays in a number of industrially important materials such as silicon, glass, and polymers. To demonstrate the achieved quality and applicability of the structures, we probe how nanotube fine-tuning induces broadband antireflection and present a surface boasting extremely low reflectance of <1% across the wavelength range of 300-1050 nm.
KW - atomic layer deposition
KW - binary/hierarchical nanostructures
KW - broadband antireflection
KW - multiple patterning
KW - nanofabrication
KW - nanotubes
UR - http://www.scopus.com/inward/record.url?scp=85091580534&partnerID=8YFLogxK
U2 - 10.1021/acsnano.0c05497
DO - 10.1021/acsnano.0c05497
M3 - Article
C2 - 32813489
AN - SCOPUS:85091580534
SN - 1936-0851
VL - 14
SP - 12091
EP - 12100
JO - ACS Nano
JF - ACS Nano
IS - 9
ER -