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Pulsed laser deposition of thin carbon films in a neutral gas background
F. Guzmán
, M. Favre
, H. M. Ruiz
, S. Hevia
, L. S. Caballero
, E. S. Wyndham
, H. Bhuyan
, M. Flores
, S. Mändl
Research output
:
Contribution to journal
›
Article
›
peer-review
20
Scopus citations
Overview
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Keyphrases
Pulsed Laser Deposition
100%
Neutral Gas
100%
Laser Plasma
100%
Carbon Thin Film
100%
High Content
50%
Carbon Film
50%
Carbon Ions
50%
Ion Energy
50%
High Pressure
25%
Argon
25%
Structural Properties
25%
Strong Correlation
25%
Fast Response
25%
Helium
25%
Bond-associated
25%
Raman Spectroscopy
25%
Carbon Plasma
25%
Space-resolved
25%
Faraday Cup
25%
Plasma Composition
25%
Carbon Films Deposition
25%
Background Gas
25%
Nd-YAG
25%
Amorphous Carbon
25%
C2 Molecule
25%
INIS
gases
100%
carbon
100%
deposition
100%
films
100%
lasers
100%
plasma
66%
energy
33%
carbon ions
33%
argon
16%
space
16%
high pressure
16%
raman spectroscopy
16%
molecules
16%
helium
16%
afm
16%
xps
16%
neodymium lasers
16%
laser-produced plasma
16%
sims
16%
faraday cups
16%
Physics
Neutral Gas
100%
Laser Plasmas
100%
Pulsed Laser Deposition
100%
X Ray Spectroscopy
33%
Raman Spectroscopy
33%
Fluence
33%
Carbon Laser
33%
Plasma Composition
33%
Blood Plasma
33%